The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1993
Filed:
Aug. 03, 1992
Applicant:
Inventors:
Assignee:
Kyodo Printing Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K / ; G02F / ;
U.S. Cl.
CPC ...
430 20 ; 430-5 ; 430320 ; 430322 ; 430324 ; 430329 ; 430331 ; 430945 ; 356237 ; 427140 ;
Abstract
The invention relates to a technique for retouching a pattern which is formed on one side of a substrate and which partially has defects. A method of retouching the pattern, according to the invention, comprises coating the one side of the substrate including the pattern, with a retouching protective membrane, exposing the one side of the substrate, with reference to portions having defects, filling the portions of the exposed one side of the substrate, with retouching material, and removing the retouching protective membrane. One of the retouching protective membrane and the retouching material is made of water-soluble material, while the other is made of oil-soluble material.