The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1993
Filed:
Apr. 02, 1992
Applicant:
Inventors:
Gabriel L Miller, Westfield, NJ (US);
Eric R Wagner, South Plainfield, NJ (US);
Assignee:
AT&T Bell Laboratories, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
5128 / ; 51317 ; 5126 / ; 51325 ;
Abstract
Slurry in a slurry polisher is ultrasonically agitated during polishing to dislodge embedded debris and grit from the polishing pad and thereby improve the uniformity of material removal, lengthen the life of the pad and avoid scratches and defects on the surface being polished. The method is particularly useful for applications in which slurry polishing is used for planarizing deposited layers on semiconductor wafers where non-uniformities caused by such embedded material can affect process yields. Apparatus is disclosed for applying ultrasonic energy to the slurry so that such energy is focussed on the pad.