The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1993

Filed:

Jun. 18, 1991
Applicant:
Inventors:

Noriaki Yamagata, Shibukawa, JP;

Nobuyuki Yoshino, Shibukawa, JP;

Shuichi Hirai, Machida, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041922 ; 20419216 ; 20419215 ; 20429825 ; 20429835 ; 156345 ;
Abstract

A method of producing recording media which comprises steps of arranging substrates for recording media on a carrier which is purified by etching with a plasma state gas; and forming a plurality of sputtered layers on the substrates. An apparatus for producing recording media which comprises a sputtering chamber which forms a recording layer; and a treatment chamber which precedes the sputtering chamber, and in which a carrier to be arranged with substrates for the recording media is purified by a plasma state gas.


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