The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 1993
Filed:
Feb. 04, 1992
Applicant:
Inventors:
Taro Maejima, Hyogo, JP;
Masahiro Hayama, Hyogo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; B44C / ;
U.S. Cl.
CPC ...
1566591 ; 156656 ; 156664 ; 252 792 ;
Abstract
A wet etching method for forming a metal film pattern having tapered edges includes preparing a metal film deposited on a substrate, performing a treatment for making the surface of the metal film hydrophilic, forming a photoresist layer pattern with phenol novolac resin as a main component on the surface of the metal film, post-baking the photoresist layer pattern at a predetermined temperature for a predetermined time and etching the metal film with etchant including nitric acid, thereby obtaining a metal film pattern having edges with a uniform taper angle desirably controlled with precision.