The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1993
Filed:
Mar. 03, 1992
Gianfranco Cirri, Florence, IT;
Proel Tecnologie S.p.A., Florence, IT;
Abstract
A hollow cylinder (3) of suitable material (the cathode) and one or more anodes (5, 7) of suitable shape and dimensions permits the generation of high-density plasma capable of being used particularly (but not exclusively) for applications in space. The plasma is produced by an electrical discharge in a gas which flows in the device through the cathode (3) and suitable orifices (8, 27) formed in the anodes (5, 7) in order to create a pressure difference between the cathode cavity (3C) in which the discharge is to be initiated and the exterior of the device. The discharge is initiated in the first place between the hollow cathode (3) and the first anode (5) and is then transmitted to the following anodes. The cathode (3), unlike the usual hot cathodes, not only does not have a filament to heat it to a suitable temperature before the initiation of the discharge, but can operate even if kept suitably cold.