The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1993
Filed:
Jan. 14, 1992
Applicant:
Inventor:
Robert G Ahonen, Cedar, MN (US);
Assignee:
Honeywell Inc., Minneapolis, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429804 ; 20419211 ; 20429815 ; 20429828 ;
Abstract
The present invention discloses an apparatus to deposit thin films on a substrate. An ion beam produced by an ion gun, which is radio-frequency excited, impinges upon a target. The target is translatable laterally by a target holder to bring different target materials into contact with the ion beam. The targets are held at an angle to the ion beam. The target material sputtered off the target by collision with the ions is deposited on substrates held above the targets. The substrates are moved into and out of the path of the sputtered material by an unique rotating device for uniform deposition of the sputtered material.