The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1993
Filed:
Apr. 21, 1992
Applicant:
Inventor:
Tomoaki Ishida, Hyogo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ; H01L / ;
U.S. Cl.
CPC ...
456666 ; 156643 ; 437190 ; 437192 ; 437245 ;
Abstract
The present invention is mainly characterized by obtaining a dry etching method which is improved to obtain a copper interconnection pattern with high dimensional accuracy. A resist pattern is formed on a copper interconnection layer formed on a substrate. Using the resist pattern as a mask, the copper interconnection layer is etched with plasma of an iodine type compound selected from the group consisting of HI, I.sub.2, BI.sub.3 and SiI.sub.4.