The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 1993

Filed:

May. 28, 1991
Applicant:
Inventors:

Michael T Sheehan, Corpus Christi, TX (US);

James H Rea, Corpus Christi, TX (US);

Assignee:

Hoechst Celanese Corporation, Somerville, NJ (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
525344 ; 5253333 ; 5253335 ; 5253336 ; 525346 ; 525374 ;
Abstract

The present invention pertains to a process for the preparation of polymers comprising poly(4-hydroxystyrene) or substituted poly(4-hydroxystyrene) or both. The polymers have low optical density (absorbance) over a wavelength range from about 240 to about 260 nm, as well as low optical density over the near UV and visible spectrum (310 to 800 nm). Such polymers are produced by polymerizing 4-acetoxystyrene and/or substituted 4-acetoxystyrene monomers, with or without other comonomers, and subsequently performing transesterification. In the most preferred embodiment of the present invention, the polymers are produced using at least one alcohol as a reaction medium, a chain transfer agent and a transesterification reactant, providing an unusually economic process. These polymers are particularly useful as photoresist components for use in combination with deep UV, X-ray, and E-Beam imaging systems. To obtain polymers having low optical density over the 240 to 260 nm radiation wavelength range, it is necessary to use an initiator which does not comprise a substantially absorbant structure over the 240 to 260 nm range or to use an initiator concentration of less than about 3 mole % of the monomer(s), to obtain a polymerization conversion of the initial polymerization monomers of at least about 90% by weight, or to remove residual monomer(s) from the reaction medium prior to transesterification, and to obtain a transesterification conversion of the polymerized monomers of at least 85% by weight. It is also necessary to avoid the use of transesterification catalyst which can cause the formation of chemical structures which can absorb over the 240 to 260 nm radiation wavelength range.


Find Patent Forward Citations

Sheehan, Michael. (1993). Process for making low optical density polymers and copolymers for (U.S. Patent No. 5239015). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5239015

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…