The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 1993
Filed:
Jan. 17, 1992
Steven H Macomber, Bethel, CT (US);
Jeffrey S Mott, Shenorock, NY (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
An apparatus 10 for exposing a chirped grating pattern of monochromatic light on a photoresist coated semiconductor wafer 12 includes an argon gas laser 14 that outputs a monochromatic light beam 16. This monochromatic light beam 16 is filtered and collimated to produce a monochromatic light beam with a planar wavefront 24. A portion of this planar wavefront passes through a cylindrical lens 26 and a first baffle slit 30, producing a cylindrical wavefront 34 that is incident upon a hypotenuse face 38 of a right angle prism 40. Another portion of the planar wavefront passes through a second baffle slit 32, producing a smaller planar wavefront 36 that is also incident upon the hypotenuse face 38 of the right angle prism 40. A destructive interference between a reflected cylindrical wavefront 92 and a direct planar wavefront 90 inside the prism 40 produces a chirped grating pattern of monochromatic light on an adjacent prism face 42. This chirped grating pattern of monochromatic light is projected toward the semiconductor wafer 12, thereby exposing the photoresist coated wafer surface 48 with the chirped grating pattern.