The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 1993
Filed:
Jul. 19, 1991
Dong-Soo Bang, Seoul, KR;
Jun-Young Kim, Suweon, KR;
SamSung Electronics Co., Ltd., Suweon, KR;
Abstract
An open-tube type impurity diffusion apparatus for simultaneously diffusing impurities into a plurality of wafers in a same controlled environment. The apparatus includes a diffusion box including a diffusion source, a diffusion box for holding a plurality of wafers, a slider including a body having a perforated portion and non-perforated portion and heaters disposed in a furnace. Because the apparatus can be used to simultaneously diffuse impurities into a plurality of wafers once, a mass of semiconductors can be produced, production cost and time can be decreased, and deviation of the wafer characteristics from wafer to wafer within a batch can be minimized.