The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 1993
Filed:
Apr. 02, 1991
Applicant:
Inventors:
Jiun-Chen Wu, Holland, PA (US);
William J Work, Huntington Valley, PA (US);
David L Dunkelberger, Newtown, PA (US);
Newman M Bortnick, Oreland, PA (US);
Assignee:
Rohm and Haas Company, Philadelphia, PA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ; C08L / ; C08L / ; C08L / ; C08L / ; C08L / ; C08L / ;
U.S. Cl.
CPC ...
525 85 ; 525 543 ; 525 64 ; 525 65 ; 525 66 ; 525 67 ; 525 71 ; 525 74 ; 525 81 ; 525 82 ; 525228 ; 525932 ;
Abstract
Polymer particles in a size range between 2 and 15 micrometers, and having a refractive index close to, but not identical with, that of a matrix polymer and optionally having one or more enclosing shells, the outer shell being compatible with the matrix polymer, impart light-diffusing properties to the matrix polymer without degrading its physical properties, while the particles having a closer refractive index match to the matrix polymer impart gloss reduction to the surface of the matrix polymer.