The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 1993
Filed:
Jul. 06, 1992
Applicant:
Inventor:
Masatoshi Fujiwara, Itami, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430321 ; 430330 ; 430394 ;
Abstract
A method of producing a .lambda./4 shifted diffraction grating, includes applying an image reversible resist on a substrate on which a diffraction grating is to be formed, exposing a predetermined with light of a first predetermined region of the resist with light of a first predetermined energy, exposing all of the resist with light interference fringes of a second predetermined energy, baking, and thereafter developing the image reversible resist.