The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 1993
Filed:
Jun. 29, 1992
Applicant:
Inventors:
Diethard Kapp-Schwoerer, Greenwich, CT (US);
David C Siemers, Evansville, IN (US);
James L Isonhood, Henderson, KY (US);
Donald E Miller, Evansville, IN (US);
Assignee:
Ciba-Geigy Corporation, Ardsley, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427508 ; 427510 ; 427542 ; 427557 ; 427209 ; 427294 ; 427295 ; 427384 ; 4273982 ; 427470 ;
Abstract
A process for producing thin photoresists on printed circuit boards wherein a metallic-layered substrate is conveyed beneath a free falling curtain of a photopolymerizable substance, said substance having a viscosity of 30-120 seconds DIN cup 4 @ 25.degree. C. and being applied at a curtain height of 5-25 cm. above the board to form a coating having a dry film thickness up to about 1.5 mil after the coated surfaces are dried, whereupon the surfaces are available for photoimaging, developing, etching and stripping operations.