The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1993
Filed:
Feb. 12, 1991
Taisuke Oguchi, Mito, JP;
Hiroaki Hanafusa, Mito, JP;
Juichi Noda, Machida, JP;
Noriyoshi Yamada, Tokyo, JP;
Shiro Nishi, Kodaira, JP;
Nobuo Tomita, Johoku, JP;
Nippon Telegraph and Telephone Corporation, Tokyo, JP;
Abstract
A dielectric multilayer filter applicable to optical communication systems is disclosed, as is a fabrication method therefor, and an optical element incorporating the same. The disclosed dielectric multilayer filter includes a fluorinated polyimide base layer with a dielectric multilayer formed thereover. According to the disclosed fabrication method, a fluorinated polyimide layer is formed by applying liquid fluorinated polyimide material over a smooth surface to a predetermined thickness followed by drying and hardening, after which a dielectric multilayer is formed over the fluorinated polyimide layer by an ion assist vapor deposition method, and then stripping the fluorinated polyimide layer away from the underlying smooth surface. The disclosed dielectric multilayer filter can be easily and economically produced at a suitably small thickness with no need for grinding, exhibits highly uniform physical and optical properties, and is exceedingly durable and resistant to curling and warping.