The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1993
Filed:
Oct. 19, 1992
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Abstract
Disclosed herein is a process for producing a minute-patterned substrate required for optical disk substrates for information recording or the like, which process comprises forming a coating film of a solution containing a metal-organic compound and a thickener on a substrate, pressing a mold against the coating film on the substrate under a reduced pressure and heating the coating film to set up the coating film, then removing the mold, and heating the set coating film on the substrate. By the process it is possible to provide the substrate surface with a minute rough pattern, without generation of surface defects arising from the pressing of the mold against the coating film, and to set up the coating film in a short time and with good dimensional accuracy. It is therefore possible to produce a rough surface pattern with high productivity.