The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 1993
Filed:
Jul. 24, 1990
Toru Musha, Tokyo, JP;
Takeshi Yamazaki, Tokyo, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
A focus error detecting apparatus in which a light emitting and receiving element including a light emitting portion and light receiving portions all of which are formed in a common semiconductor substrate, a hologram element diffracts a light beam reflected by an object to generate plus and minus first-order diffraction light beams and to introduce an astigmatism into the plus and minus first-order diffraction light beams such that shapes of spots of the diffraction light beams formed on the light receiving portions of the light emitting and receiving element vary into substantially reverse directions to each other, and a focusing condition is detected in accordance with outputs of the light receiving portions. Therefore, in this apparatus, positioning adjustment of the light receiving portions with respect to the light emitting portion is not necessary, and thus a number of the adjusting process can be remarkably decreased and the cost for manufacturing the apparatus can be reduced. Furthermore, the focusing condition can be detected with high accuracy.