The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 1993
Filed:
Aug. 23, 1990
Yoshimitsu Kanno, Sagamihara, JP;
Toshiharu Kurosawa, Yokohama, JP;
Hidehiko Kawakami, Tokyo, JP;
Hiroaki Kotera, Kawasaki, JP;
Hiroyoshi Tsuchiya, Abuta, JP;
Hideaki Ohira, Ueda, JP;
Mutuo Hashizume, Saku, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Matsushita Graphic Communication Systems, Inc., Tokyo, JP;
Abstract
A correspondence relation between a structure of a bi-level pattern A and a structure of a bi-level pattern B is statistically learned by use of a learning high-density image. The bi-level pattern A forms a partial region of a low-density character and line image except a screened dot image. The bi-level pattern B forms a corresponding partial region of a desired high-density image. A judgement is made as to whether the low-density image is equal to or different from a screened dot image. Reference pixels are selected from the partial region of the low-density image. The low-density bi-level pattern A is converted into the high-density bi-level pattern B on the basis of a result of the learning by use of the selected reference pixels when the low-density image is different from a screened dot image. A pixel of the low-density image is repeated to convert the low-density image into the high-density image when the low-density image is equal to a screend dot image.