The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 1993
Filed:
Oct. 21, 1991
Applicant:
Inventors:
Rene Stein, Roettenbach, DE;
Georg Wittmann, Erlangen, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F / ;
U.S. Cl.
CPC ...
2041291 ; 20412975 ; 2041296 ;
Abstract
The invention provides an improved method for polish-etching of silicon carbide, which is arranged in series with an electrolyte and a metallic counter-electrode in a current circuit with an adjustable direct voltage, wherein an alkaline solution is used as the electrolyte, preferably in a high concentration and at great current density. In this way, uniform removal of the material and an even surface are obtained.
Stein, Rene. (1993). Method for electrolytic etching of silicon carbide (U.S. Patent No. 5227034). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5227034
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile