The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 1993
Filed:
Apr. 08, 1991
Nobutoshi Kobayashi, Tokyo, JP;
Naoki Yoshida, Tokyo, JP;
Nippon Scientific Co., Ltd., Tokyo, JP;
Abstract
A plasma etching apparatus capable of accurately controlling the voltage levels of the pins and the temperature of the device under test in the etching process. The apparatus includes: a radiator, located below the table on which the device under test is placed, for releasing heat from the table; and a thermoelectric cooling element, located between the table and the radiator, for controlling temperature of the device under test on the table. The apparatus may also includes: a detachable adaptor, fixedly mounted on the table, made by an electrically and thermally conductive material, and having at least one trapezoidal ridge with trapezoidal cross section having sloping sides inclined by an angle larger than an angle of the pins of the device under test, for holding the device under test on a top face of the trapezoidal ridge with the pins hanging along the sloping sides; and a detachable holder, fixedly attached to the adaptor over the device under test, and having an opening through which the plasmas are injected onto the device under test, for pressing down the device under test with respect to the adaptor.