The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 1993
Filed:
Mar. 03, 1992
Applicant:
Inventors:
Cheng-Kung Liu, Norwalk, CT (US);
John C Brewer, Bristol, CT (US);
Assignee:
United States Surgical Corporation, Norwalk, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K / ;
U.S. Cl.
CPC ...
523111 ; 528289 ; 606230 ;
Abstract
A polyetherimide suture exhibits excellent properties such as resistance to creep, great knot security and physical stability. The suture may be monofilament or multifilament, and methods of making and using the suture are disclosed.
Liu, Cheng-Kung. (1993). Polyetherimide ester suture and its method of manufacture and method of (U.S. Patent No. 5225485). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5225485
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile