The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 1993

Filed:

Nov. 05, 1991
Applicant:
Inventors:

Toshiya Mizuno, Tsuchiura, JP;

Yoshikichi Teramoto, Tsuchiura, JP;

Takeshi Saito, Tsuchiura, JP;

Juichi Wakabayashi, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G / ; C08L / ;
U.S. Cl.
CPC ...
525471 ; 525537 ; 2642902 ;
Abstract

Disclosed herein is a heat-resistant film obtained by biaxially-stretching a composition which comprises (A) 50-90 parts by weight of a polyetheretherketone having predominant recurring units of the formula: ##STR1## and (B) 50-10 parts by weight of a substantially linear poly(arylene sulfide) having melt viscosity of at least 1,000 poises. A production process of such a heat-resistant film is also disclosed, which comprises biaxially stretching the above composition in a temperature range at least equal to the crystallization temperature (Tc) of the poly(arylene sulfide) but not higher than the crystallization temperature (Tc) of the polyetheretherketone.


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Mizuno, Toshiya. (1993). Heat-resistant film and production process thereof (U.S. Patent No. 5223585). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5223585

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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