The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 1993

Filed:

Nov. 21, 1991
Applicant:
Inventors:

Hendrikus van den Berg, Venlo-Blerick, NL;

Udo Konig, Essen, DE;

Ralf Tabersky, Bottrop, DE;

Josef Blum, Essen, DE;

Assignee:

Fried. Krupp GmbH, Essen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; B32B / ;
U.S. Cl.
CPC ...
428336 ; 51295 ; 51307 ; 51309 ; 407119 ; 428472 ; 428697 ; 428698 ; 428699 ;
Abstract

A tool having an extended service lift and including a hard metal body, and at least one surface layer composed of at least one hard substance selected from the group consisting of carbides, nitrides, and carbonitrides of titanium and zirconium, and having a chlorine content ranging from a finite amount up to 4 mass percent, the tool being produced by plasma-activated CVD process including: a. positioning the hard metal body in a CVD chamber having means for supplying direct voltage thereto, the hard metal body being connected to the direct voltage supplying means as a cathode thereof, b. introducing into the CVD chamber a reactive gas mixture including a nitrogen-containing substance, a carbon-containing substance, and at least one compound containing at least one of titanium and zirconium, and c. exciting plasma formation at the hard metal body and coating same by chemical vapor deposition by applying a pulsed direct voltage and a residual direct voltage thereto, the residual direct voltage having a magnitude which is at least equal to the lowest ionization potential of any gas in the reactive gas mixture but does not exceed 50% of the maximum value of the pulsed direct voltage.


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