The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 1993
Filed:
Oct. 18, 1991
Applicant:
Inventor:
Joachim Doehler, Union Lake, MI (US);
Assignee:
Energy Conversion Devices, Inc., Troy, MI (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
427575 ; 427573 ; 427570 ; 427569 ; 427237 ; 427238 ; 427105 ; 118723 ; 118729 ;
Abstract
A method for the low temperature, microwave enhanced, chemical vacuum deposition of thin film material onto a surface of a hollow member by creating a sub-atmospheric pressure condition adjacent the surface to be coated while maintaining the applicator through which microwave energy is introduced at substantially atmospheric pressure.
Quick Actions:
Doehler, Joachim. (1993). Low temperature plasma enhanced cvd process within tubular members (U.S. Patent No. 5223308). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5223308
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