The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1993
Filed:
Aug. 29, 1991
Jurgen Thieme, Diemarden, DE;
Bastian Nieman, Gottingen, DE;
Gunter Schmahl, Gottingen, DE;
Dietbert Rudolph, Nordheim, DE;
Carl-Zeiss-Stiftung, Heidenheim, US;
Abstract
The invention is directed to an X-ray microscope having a pulsed X-ray radiation source which supplies an intensive line radiation such as a plasma focus source. The microscope includes a reflecting condenser which focusses the radiation of the radiation source on the specimen to be investigated and an X-ray optic configured as a zone plate. With the zone plate, the specimen is imaged on an X-ray detector with a high resolution. The above combination of elements makes it possible to free an adequately high amount of X-ray energy at the location of the specimen while providing a high resolution free of image errors so that the required short exposure times are provided for the investigation of living cells.