The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 1993

Filed:

May. 28, 1992
Applicant:
Inventors:

Tadayuki Ohmae, Chiba, JP;

Yoshiki Toyoshima, Ichihara, JP;

Kentaro Mashita, Ichihara, JP;

Noboru Yamaguchi, Ichihara, JP;

Jinsho Nambu, Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
525 66 ; 525179 ;
Abstract

An impact-resistant polyamide resin is produced by


Find Patent Forward Citations

Ohmae, Tadayuki. (1993). Process for producing impact-resistant polyamide resin compositions (U.S. Patent No. 5221712). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5221712

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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