The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1993
Filed:
Aug. 19, 1991
Applicant:
Inventors:
Rinshi Sugino, Atsugi, JP;
Takashi Ito, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156651 ; 156656 ; 156657 ; 156662 ; 252 791 ; 252 793 ; 134-1 ; 134-2 ; 134-3 ;
Abstract
The surface of a semiconductor substrate is cleaned effectively by etching the surface by placing the substrate in a halogen containing atmosphere, irradiating the atmosphere and the semiconductor surface with ultraviolet rays, and wet solution cleaning of the formed reactant from the substrate surface.
Sugino, Rinshi. (1993). Process for cleaning surface of semiconductor substrate (U.S. Patent No. 5221423). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5221423
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile