The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1993
Filed:
May. 31, 1991
Applicant:
Inventors:
Toshinori Kishi, Osaka, JP;
Michiyoshi Nagashima, Ikoma, JP;
Fumiaki Ueno, Hirakata, JP;
Taro Nambu, Kobe, JP;
Hiroyuki Ogawa, Moriguchi, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Kadoma, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B05D / ; B05D / ;
U.S. Cl.
CPC ...
156627 ; 118712 ; 118723 ; 118730 ; 118 501 ; 118620 ; 156643 ; 156655 ; 156345 ; 427535 ;
Abstract
In a plasma surface treating method, a sample to be treated is supported on a first electrode within a vacuum vessel and a second electrode is caused to confront the first electrode. Active species of negative ions are then generated by means of a direct current glow discharge produced in an abnormal glow discharge region and are subsequently impinged upon a surface of the sample to induce a chemical reaction with the sample.