The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 1993
Filed:
Mar. 25, 1992
Peisen Huang, Ann Arbor, MI (US);
Satoshi Kiyono, Sendai 980, JP;
Other;
Abstract
A new method of angle measurement is based on the internal reflection effect at an air/glass boundary. The method uses a differential detection scheme to largely reduce the inherent non-linearity of the reflectance versus the angle of incidence in internal reflection. With non-linearity reduced, the displacement of the angle of incidence can be determined accurately by measuring the reflectance. The resolution and measurement range are determined by the initial angle of incidence, the polarization state of light, and the number of reflections. Compared with interferometers and autocollimators, this method has the advantage of a simple sensor design for applications ranging from very wide measurement range to extremely high resolution. Apparatus for accomplishing the method comprises a beamsplitter, a pair of critical angle prisms and a pair of photodiodes. Each photodiode measures change in reflectance and with the application of suitable computation means produces an angle measurement of the beam incident to the beamsplitter.