The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 1993
Filed:
May. 26, 1992
Motomu Furukawa, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A driving mechanism usable in an electron beam exposure apparatus, X-ray exposure apparatus, ion beam exposure apparatus, evaporation apparatus, chemical vapor deposition apparatus or otherwise, for rectilinearly moving a wafer carrying stage in a vacuum chamber is disclosed. The mechanism includes a guide shaft, a partition flange fixed to the guide shaft, a pair of bearing assemblies slidably mounted to the guide shaft and disposed on the opposite sides of the flange, a coupling barrel for coupling the paired bearing assemblies and covering the guide shaft portion between the bearing assemblies, and a fluid supplying system for supplying fluids to the opposite sides of the partition flange. With this structure, the stage can be moved rectilinearly by controlling the fluid pressures on the opposite sides of the flange, while retaining high vacuum in the vacuum chamber.