The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 1993
Filed:
Dec. 11, 1991
Joachim Roser, Mannheim, DE;
Juergen Mohr, Gruenstadt, DE;
Armin Lange, Heidelberg, DE;
Knut Oppenlaender, Ludwigshafen, DE;
Walter Denzinger, Speyer, DE;
Thomas Loerzer, Neustadt, DE;
BASF Aktiengesellschaft, Ludwigshafen, DE;
Abstract
In novel polyethyleneimine and polyvinylamine derivatives, the polyethyleneimines contain the structural elements Ia and/or Ib ##STR1## and the polyvinylamines contain the structural elements II.sub.a, II.sub.b and II.sub.c ##STR2## where, for the degrees of polymerization n, m and p, n.gtoreq.1, m.gtoreq.0 and p.gtoreq.0, and X.sup.1 is CR.sup.1 R.sup.2 PO.sub.3 R.sup.3 R.sup.4 or CR.sup.1 R.sup.2 SO.sub.3 R.sup.3, X.sup.2 independently of X.sup.1 is hydrogen, CR.sup.1 R.sup.2 PO.sub.3 R.sup.3 R.sup.4 or CR.sup.1 R.sup.2 SO.sub.3 R.sup.3, Y.sup.1 and Y.sup.2 independently of one another are each one or more CHR.sup.1 PO.sub.3 R.sup.3 R.sup.4 or CHR.sup.1 SO.sub.3 R.sup.3 groups or hydrogen, Y.sup.3 and Y.sup.4 independently of one another and of Y.sup.1 and Y.sup.2 are each hydrogen, CHR.sup.1 PO.sub.3 R.sup.3 R.sup.4 or CHR.sup.1 SO.sub.3 R.sup.3, and Z.sup.1 -Z.sup.4 are identical or different inorganic and/or organic radicals, wherein R.sup.1 and R.sup.2 independently of one another are each hydrogen, C.sub.1 -C.sub.12 -alkyl or aryl and R.sup.3 and R.sup.4 independently of one another are each hydrogen, an alkali metal atom or NR.sup.5 R.sup.6 R.sup.7 R.sup.8, where R.sup.5 to R.sup.8 are identical or different radicals selected from the group consisting of hydrogen, alkyl, aryl, hydroxyalkyl and benzyl. Aluminum-based substrates coated with these polyethyleneimines and/or polyvinylamines are used for the production of offset printing plates.