The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 1993

Filed:

Dec. 16, 1991
Applicant:
Inventors:

Jacques Thebault, Bordeaux, FR;

Jean L Domblides, Bruges, FR;

Lionel Vandenbulcke, Saint Jean le Blanc, FR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ; C23G / ;
U.S. Cl.
CPC ...
4272481 ; 427249 ; 118715 ; 118719 ; 118725 ;
Abstract

A porous substrate is placed inside an enclosure and a gas flow is injected into the enclosure under predetermined conditions of temperature and pressure to form a solid deposit within the accessible pores inside the substrate. A wall that is permeable to the gas flow is interposed on the path of the flow between its inlet into the enclosure and the substrate, the wall not being in contact with the substrate, thereby forming around the substrate a region which is free from strong turbulence so that infiltration is performed essentially under diffusion conditions, thereby minimizing the deposition gradient within the volume of the substrate.


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