The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 1993
Filed:
Jun. 18, 1991
Masamitsu Shirai, Osaka, JP;
Masahiro Tsunooka, Osaka, JP;
Kanji Nishijima, Osaka, JP;
Katsukiyo Ishikawa, Kyoto, JP;
Nippon Paint Co., Ltd., Osaka, JP;
Abstract
A novel positive type photosensitive resinous composition comprising a base resin having in at least one side chain or at an end portion of its main chain, an iminosulfonate group of the formula: ##STR1## in which R.sub.1 and R.sub.2 are the same or different groups and each represents hydrogen atom, alkyl, acyl, phenyl, naphthyl, anthryl or benzyl group and R.sub.1 and R.sub.2, taken together with the carbon atom, may be an alicyclic ring, the composition further comprising a group containing an acid-decomposable bond, the content of said iminosulfonate group being 1.times.10.sup.-5 to 3.times.10.sup.-3 equivalent/g of the base resin. The present composition, when irradiated with radiation with 200 to 400 nm wavelength, can generate strong sulfonic acid groups, and is specifically useful as a photoresist for a circuit board, integrated circuit and the like.