The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 1993

Filed:

Mar. 16, 1992
Applicant:
Inventors:

Kurt Hoffmann, Lautertal, DE;

Thomas Kainmuller, Lindenfels/Odenwald, DE;

Rudolf Pfaendner, Rimbach/Odenwald, DE;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ;
U.S. Cl.
CPC ...
525534 ; 525535 ; 528 97 ; 528 98 ; 528 99 ; 528125 ; 528172 ; 528175 ;
Abstract

There are disclosed substantially linear polyarylene ether sulfones having a reduced viscosity of having a reduced viscosity of ca. 0.25 to ca. 1.5 dl/g (measured in a 1% solution in DMF at 25.degree. C.) and consisting essentially of 95-99.8% by weight of segments of formula I and of 5-0.2% by weight of segments of formula IIa, formula IIb and/or formula IIc ##STR1## the percentages by weight being based on the entire polymer and the molecular weight (number average) of the segments of formula I being 6000 to ca. 60 000, if the polymer contains solely structural units of formula IIa and/or IIb, and 1000 to ca. 60 000 if the polymer contains more than 0.1% by weight of structural units of formula IIc, and R consists of the recurring structural units of formula Ia and/or of up to 99.8% by weight, based on the total polymer, of recurring structural units of formula Ib ##STR2## wherein R.sub.1 is C.sub.1 -C.sub.6 alkyl, C.sub.3 -C.sub.10 alkenyl, phenyl or halogen, p is an integer from 0 to 4 Ar.sub.1 and Ar.sub.2 are each independently of the other divalent carbocylic-aromatic radicals, Z.sub.1 is a divalent radical of a cycloaliphatic, aromatic or araliphatic dihydroxy compound after removal of both hydroxyl groups, Z.sub.2 is a divalent radical of a cycloaliphatic, aromatic or araliphatic di-secondary amino compound after removal of both N-hydrogen atoms, m is an integer from 1 to ca. 10, and Z.sub.3 is a trivalent radical of a cycloaliphatic, aromatic or araliphatic compound containing hydroxy and/or amino groups after removal of the hydroxyl groups and/or active hydrogen atoms bound to amino nitrogen atoms, which radicals Ar.sub.1, Ar.sub.2, Z.sub.1, Z.sub.2 and Z.sub.3 may be substituted by one to four C.sub.1 -C.sub.6 alkyl groups, C.sub.3 -C.sub.10 alkenyl groups, phenyl groups or halogen atoms, and in which radicals Z.sub.1, Z.sub.2 and Z.sub.3 one, two, three or four ring carbon atoms may be replaced by oxygen, sulfur and/or nitrogen atoms.


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