The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1993
Filed:
Jun. 28, 1991
Applicant:
Inventors:
Angelo A Lamola, Sudbury, MA (US);
Gary Calabrese, North Andover, MA (US);
Roger Sinta, Woburn, MA (US);
Assignee:
Shipley Company Inc., Newton, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430270 ; 430926 ; 430920 ; 430922 ; 430925 ; 522 50 ; 522 26 ; 522 25 ; 522 14 ; 522 16 ; 522126 ; 522146 ;
Abstract
A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have heretofore been exposed to deep UV irradiation. The invention is especially useful for acid hardening photoresist systems.
Quick Actions:
Lamola, Angelo. (1993). Near uv photoresist (U.S. Patent No. 5212046). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5212046
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile