The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1993
Filed:
Sep. 23, 1991
Applicant:
Inventors:
Katsuaki Saito, Hitachi, JP;
Takuya Fukuda, Hitachi, JP;
Michio Ohue, Hitachi, JP;
Tadasi Sonobe, Iwaki, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ; C23F / ;
U.S. Cl.
CPC ...
20419232 ; 20429831 ; 20429833 ; 20429834 ; 20429837 ; 20429838 ; 156345 ; 156643 ; 118723 ; 134-1 ;
Abstract
A plasma processing apparatus performs a sample processing and cleaning processing. The sample processing is carried out by generating a reaction gas plasma within a vacuum vessel of the apparatus using an electron cyclotron resonance excitation. The cleaning processing is carried out to clean the inner wall of the vacuum vessel by generating a cleaning gas plasma within the vacuum vessel. Generation of the cleaning gas plasma takes place by using either one of the following processes: