The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1993
Filed:
Oct. 11, 1991
Applicant:
Inventor:
Yoichiro Ota, Itami, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118722 ; 118715 ; 118725 ; 118726 ; 423219 ;
Abstract
A chemical vapor deposition apparatus having a gas purifier for purifying a raw-material gas such as AsH.sub.3 or PH.sub.3 gas, the gas purifier being constructed as the combination of an organometal and a molecular sieve. Gas of AsH.sub.3, PH.sub.3 or the like is introduced into the organometal whereby impurities such as H.sub.2 O or O.sub.2 contained in the raw-material gas (AsH.sub.3, PH.sub.3, etc) are removed. Further, organometal vapor occured from gas purifier is removed by the molecular sieve.