The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1993
Filed:
Mar. 29, 1991
Gaylord E Moss, Marina del Rey, CA (US);
Kevin Yu, Temple City, CA (US);
John E Wreede, Azusa, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
A hologram efficiency adjusting process that includes scanning the brightness effect of a hologram, which is either the hologram to be adjusted or a hologram representative of the hologram to be adjusted, to provide brightness vs. position information. The brightness information is utilized to produce a variable duty cycle half-tone mask that contains a pattern defining the areas of the hologram which are to be removed, with the pattern being unresolvable by the viewer of the hologram from which holograms have been removed pursuant to the mask pattern. The hologram to be adjusted is then photoresist coated and etched in accordance with the mask. Alternatively, the brightness information can be utilized to directly expose, for example by a laser scanner, photoresist disposed on the hologram to be adjusted.