The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1993
Filed:
Aug. 14, 1989
Applicant:
Inventors:
Tomoaki Takekoshi, Shizuoka, JP;
Sho Nakao, Shizuoka, JP;
Hisao Ohba, Shizuoka, JP;
Seiji Shigetaka, Shizuoka, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03D / ;
U.S. Cl.
CPC ...
430302 ; 430320 ; 430434 ; 354317 ; 354319 ; 354325 ;
Abstract
A method and an apparatus for developing a photosensitive lithographic plate at least one layer of which has been exposed with an image by a developer with conveying the same with the one layer facing substantially downwards, the method and apparatus being arranged in such a manner that the developer is supplied to the one layer and the thus-supplied developer is retained on the same layer. Therefore, the photosensitive lithographic plate can be developed without any necessity of being dipped in the developer.