The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1993
Filed:
May. 29, 1992
Applicant:
Inventors:
Shuichi Nakamura, Yasugi, JP;
Hakaru Sasaki, Matsue, JP;
Assignee:
Hitachi Metals, Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C22C / ;
U.S. Cl.
CPC ...
420 94 ; 148336 ; 148621 ; 148653 ;
Abstract
A high-fineness shadow mask material comprising 33-40% by weight of Ni, 0.0001-0.0015% by weight of one or more of boron, magnesium and titanium, and the remainder consisting essentially of Fe, wherein the contents of sulfur and aluminum are confined to not more than 0.0020% and not more than 0.020% by weight, respectively, and a process for producing the material. The shadow mask material according to this invention is excellent in hot working property and in etching properties.