The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1993
Filed:
Dec. 12, 1991
Daniel Gelbart, Vancouver, CA;
Amos Michelson, Vancouver, CA;
Creo Products Inc., Burnaby, CA;
Abstract
A processless phototool generator uses a pulsed excimer laser to image a deformable mirror spatial light modulator onto a thin ablateable coating on a quartz substrate. The light pulse ablates and clears the coating from selected areas according to the data pattern in the deformable mirror array. Exposure uniformity is enhanced by a two dimensional overwriting method. The high image reduction ratio enables high power densities on the substrate without exceeding the permissible power density on the deformable mirror array. Since the recording is processless (i.e. no development required) the generated image can be verified immediately after writing. The last feature is of particular importance in phase-shift masks.