The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1993
Filed:
Jan. 03, 1991
Lam F Wong, Fairport, NY (US);
Stephen C Arnone, Rochester, NY (US);
William J Nowak, Webster, NY (US);
Daniel W Costanza, Webster, NY (US);
Jacob N Kluger, Rochester, NY (US);
Ssujan Hou, Webster, NY (US);
Lloyd W Durfey, Palmyra, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
A method and apparatus for transverse registration of image exposures on photoreceptive belts subject to lateral deviation from linear travel in which targets, corresponding in location to the image areas to be exposed, are used for the detection of lateral belt displacement and to control the transverse location of exposure scan. The targets are of a pattern defining a reference line and a line inclined with respect to the direction of belt travel so that the duration of time between passage of the target lines with respect to a spacially fixed sensing axis will vary with lateral displacement of the belt. The targets may assume a variety of specific patterns and the invention is applicable to single and multi-pass image exposure systems as well as to both modulated laser and light emitting diode types of exposure devices.