The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 1993

Filed:

May. 16, 1990
Applicant:
Inventors:

Michael Shao, Pasadena, CA (US);

Norbert A Massie, San Ramon, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356358 ; 356153 ;
Abstract

In multi-telescope arrays that comprise multiple telescopes, a beam-combining module, and flat mirrors for directing light beams from the multiple telescopes to the beam combining module, a laser metrology system is used for monitoring various pathlengths along a beam path where deviations are likely. Some pathlengths are defined simply by a pair of retroreflectors or reflectors at both ends. Lengths between pairs of retroreflectors are measured and monitored by laser interferometers. One critical pathlength deviation is related to the displacement of the flat mirror. A reference frame is set up relative to the beam-combining module to form and define the coordinate system within which the positions of the flat mirrors are measured and monitored. In the preferred embodiment, a pair of retroreflectors along the optical axis of the beam-combining module defines a reference frame. A triangle is formed by the reference frame as the base and another retroreflector at the flat mirror as the vertex. The triangle is used to monitor the position of the flat mirror. A beam's pathlength is dynamically corrected in response to the monitored deviations.


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