The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1993
Filed:
May. 15, 1991
Toshiro Tsumori, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A photosensitive resin composition, which is a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, is disclosed. The photoreactive acid catalyst generator contains tetrakis-1,2,4,5-(polyhalomethyl)benzene or tris(polyhalomethyl)benzene. The composition is a so-called three-component chemically amplified photoresist. When irradiated with an excimer laser light, the photoreactive acid generator is decomposed to yield a Lewis acid catalyst, while also yielding radicals, the photoreactive acid generator acting itself as an acid-linking auxiliary to improve the sensitivity of the photosensitive resin composition significantly. It becomes possible in this manner to form a fine resist pattern with superior resolution in the excimer laser lithography. On the other hand, the sensitivity dependency of the base resin or light transmittance may be lowered to increase the degree of freedom in material selection and designing.