The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1993
Filed:
Sep. 11, 1991
Applicant:
Inventor:
Keiji Shinohara, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156656 ; 156643 ; 156646 ; 156652 ; 156665 ; 437194 ; 437190 ; 437197 ;
Abstract
A process for etching an aluminum-based film disposed on a substrate is disclosed in which two specific different gases are used. One contains a hydrogen-donating gas in a volume of 10 to 99% and serves to etch and pattern the film until the substrate exposes to view, and the other is an oxidation-imparting gas for use in protecting the resulting pattern at its side walls. Over etching is attained without pattern defects.
Shinohara, Keiji. (1993). Etching process for films of aluminum or its alloys (U.S. Patent No. 5207868). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5207868
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile