The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1993
Filed:
Oct. 15, 1991
Applicant:
Inventors:
Pierre Claverie, Boulogne Billancourt, FR;
Eric Duchateau, Versailles, FR;
Pierre Karinthi, Jouy-en-Josas, FR;
Philippe Queille, Viroflay, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D / ;
U.S. Cl.
CPC ...
148206 ; 148208 ; 148237 ;
Abstract
Substantially all residual oxidizing gas in a treating atmosphere which is inert or reducing, is eliminated by injecting into the atmosphere a gaseous silicon hydride at a temperature between 50 and 1,600.degree. C. and in amount such that the ratio R of the content of hydride to the content of oxidizing gas to be eliminated is within the range of 1.5 to 20. The rapid action of the trace amounts of hydride injected enables one to control with precision heat treatment processes by maintaining the residual oxidizing gas contents below predetermined very low thresholds.