The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1993
Filed:
Feb. 07, 1992
Peter L Domenicali, Montpelier, VT (US);
Karl Suss America, Inc., Waterbury Center, VT (US);
Abstract
A proximity mask alignment system includes a remotely-focusing microscope and a video frame storage device. When a first surface, such as an integrated circuit substrate, is in focus an image of the first surface is obtained and stored. Then, after the microscope is re-focused to a second surface, such as a photomask, the stored image of the first surface is superimposed onto the 'live' image of the second surface. The two focal positions are stored, with a selected one being normally provided to the microscope. A user initiates an automatic sequence wherein the microscope focuses to the other focal position, stores an image obtained at the other focal position, then refocuses to the original focal position. The stored image is superimposed on the image currently being generated, enabling the user to simultaneous view each surface in sharp focus, facilitating the alignment of the two surfaces to one another.