The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1993
Filed:
Jul. 16, 1991
Koichi Akiyama, Choufu, JP;
Masunori Kawamura, Aichi, JP;
Kowa Company Ltd., , JP;
Abstract
An ophthalmic measurement apparatus projects a laser beam into an eye and performs measurements using the light scattered by floating cells in the eye. The aperture area of the mask that defines the field of measurement view is adjusted to correspond to measurement conditions in the eye. A system processor determines the number of floating cells based on signals from a photosensor disposed behind the mask aperture and corrects the cell count according to a predetermined formula. The aperture area of the mask is changed depending on the counted number of floating cells in such a manner that the size of the mask aperture is decreased when there are many cells in the eye and increased when there are few cells in the eye.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile