The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 1993
Filed:
Dec. 07, 1990
Frank Jansen, Webster, NY (US);
Mary A Machonkin, Webster, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
A method of forming a patterned, poly-crystalline diamond film on a substrate is disclosed. First, a photoresist layer is applied to a substrate. A diamond powder layer is formed on the photoresist layer either through spray-coating, dip-coating, spin-coating using a diamond-powder suspension, and the like. The photoresist layer is exposed to electromagnetic radiation through a mask either before or after the diamond powder layer is applied. Then, the photoresist layer is developed, after which the substrate is heated causing the photoresist layer to carbonize. The substrate is exposed to a mixture of hydrogen-containing and carbon-containing gases which are decomposed in a processing apparatus. Hydrogen in this gas mixture etches away at the carbonized photoresist layer leaving behind the patterned diamond powder layer. Carbon in these carbon-containing gases combines with the diamond particles in the diamond powder layer to form diamond structures on the substrate.