The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 1993
Filed:
Dec. 23, 1991
Applicant:
Inventors:
Arthur W Sleight, Philomath, OR (US);
Jinfan Huang, Corvallis, OR (US);
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 21 ; 372 22 ; 359328 ;
Abstract
Nonlinear optical materials having the general formula Ca.sub.1.40-X M.sub.X V.sub.0.98.+-.0.05 O.sub.4.00.+-.0.08 wherein X is 0.07 to 0.43 and M is selected from the group consisting of Bi, La, Ce, Y, Pm, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, and mixtures thereof are described. Compositions satisfying this formula belong to the space group R3c wherein a=b=10.8.+-.0.1 .ANG., and c=38.0.+-.0.3 .ANG.. These NLO compositions are capable of doubling the frequency of light at about 0.1 to about 3.3 times the efficiency of KH.sub.2 PO.sub.4 (KDP). No damage to the NLO material is observed when they are exposed to high-power lasers.