The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 1993
Filed:
Nov. 09, 1990
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
An ink recording apparatus used with printers or the like is manufactured by semiconductor device manufacturing techniques. One wall of an ink chamber is formed of a single-crystal substrate and an ink jet port is formed by etching the single-crystal substrate. The ink chamber has a pressure-applying unit therein, and the pressure is applied to ink within the ink chamber so that the ink is jetted through the ink jet port. The pressure-applying unit has piezoelectric elements. A shutter and electrodes composed of polycrystalline-silicon film are formed on the single-crystal substrate by film forming in the LPCVD method and patterning through plasma etching. A front wall is formed by coating the shutter and electrodes further with a polycrystalline-silicon film. The shutter is movable between the wall surface of the ink chamber and the front wall, being driven by an electrostatic attracting force produced between voltage-applied electrodes and the shutter. The electrodes are formed at positions corresponding to those where the shutter blocks the ink jet port and releases the same.